Low Scattering Substrates, SiO2, Wedge

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Reference number: OSE-WSSQSP-30C05-10-1

These low-dispersion substrates are in high demand for high-power laser and X-ray applications.

Diameter in mm
alt

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Description

  • Type: Low scattering substrates
  • Material: Synthetic fused silica
  • Surface flatness: λ/10
  • Wedge angle W: 1°±5´
  • Surface Quality (Scratch-Dig): 10-5